This paper is published in Volume 2, Issue 5, 2017
Area
Thinfilms
Author
Dr. Pelluri Rahi
Org/Univ
Andhra University, India
Pub. Date
09 May, 2017
Paper ID
V2I5-1155
Publisher
Keywords
VLSI, GSI, PVD, Thermal Evaporation, Point Source, Knudsen’s Assumption, etc.,

Citationsacebook

IEEE
Dr. Pelluri Rahi. Challenges in PVD Technique (Thin film Formation by Thermal Evaporation), International Journal of Advance Research, Ideas and Innovations in Technology, www.IJARnD.com.

APA
Dr. Pelluri Rahi (2017). Challenges in PVD Technique (Thin film Formation by Thermal Evaporation). International Journal of Advance Research, Ideas and Innovations in Technology, 2(5) www.IJARnD.com.

MLA
Dr. Pelluri Rahi. "Challenges in PVD Technique (Thin film Formation by Thermal Evaporation)." International Journal of Advance Research, Ideas and Innovations in Technology 2.5 (2017). www.IJARnD.com.

Abstract

Among the outstanding achievements of Science and Technology in the 21st century, thin films occupy by right a major position. The earliest first Thin Film was made by Faraday paved the way for the development of Thin film Technology. Today, Thin Film and Thin Film Systems find wide use in many fields of Science and Technology. They are employed in Electronic Systems, Communication Systems, Computer Technology, Navigation Equipment’s, Robotics, Instrumentation and Controlling Systems and in Complicated Technological Process etc., due to the specific properties of the low dimensional materials.
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